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News Release

Multimedia Available: Applied Materials Shatters Metrology Roadblocks for 65-45nm Production with Applied VeritySEM System

Feb 23, 2004 at 8:41 AM EST
PDF Version

--(BUSINESS WIRE)--

Applied Materials Inc. (Nasdaq:AMAT) extends its leadership in CD-SEM(a) technology with the new high-throughput Applied VeritySEM(tm) Metrology system. Proprietary new SEM technology enables a remarkable less than 5 angstrom precision for tightly controlling ArF(a) resist structures, line edge roughness and feature shape in 65-45nm device structures. Multiple VeritySEM systems can be matched both internally and between fabs to within one nanometer.

    You can reach the story directly by going to
http://www.newstream.com/cgi-bin/display_story.cgi?12443

This multimedia news story is for free and unrestricted use on your news information site (and for print or broadcast too). Visit http://www.newstream.com to download video, audio, text, graphics and photos.

If you have any questions about the story, or about Newstream.com, please write to us at info@newstream.com.

(a) CD-SEM: critical dimension -- scanning electron microscope
    ArF: argon fluoride


    CONTACT: Newstream, New York
             info@newstream.com

    SOURCE: Newstream and Applied Materials