Event Advisory: Panel to Explore New Directions in Memory Technology at 2011 IMW Conference
SANTA CLARA, Calif., May 16, 2011 - The global demand for memory capacity is expected to grow at a rapid pace for the foreseeable future, and the semiconductor industry is now evaluating the emerging technologies that will most likely meet this challenge. At the sub-20nm nodes, DRAM, Flash and other memory technologies may look very different from the structures we know today. Will DRAM and Flash devices continue to develop separately or will a universal memory format emerge?
To explore this important topic, Applied Materials is sponsoring a prestigious panel of experts representing key players in the memory industry at the 2011 IEEE International Memory Workshop on May 23, 2011, in Monterey, California. The panel, titled "Is Technology Taking Us in a New Direction? The Future of Memory Devices", is sure to be a lively and informative exchange of ideas.
Panel: | Laith Altimime - Imec Matti Floman - Nokia Corporation Jooyoung Lee - Samsung Electronics Co. Ltd. Sung-Kye Park - Hynix Semiconductor, Inc. Yoshitaka Tsunashima - Toshiba Corporation Raman Achutharaman - Applied Materials, Inc. (Moderator) |
Where: | Hyatt Regency Hotel Old Golf Course Road, Monterey, CA 93940 |
When: | Monday, May 23rd, 2011 |
Schedule: | 4:30-6:00pm Panel Discussion 6:00-9:00pm Reception and Poster Session |
For more information, and to register for IMW 2011, please visit: www.appliedmaterials.com/events/imw-2011.
Applied Materials, Inc. (Nasdaq:AMAT) is the global leader in providing innovative equipment, services and software to enable the manufacture of advanced semiconductor, flat panel display and solar photovoltaic products. Our technologies help make innovations like smartphones, flat screen TVs and solar panels more affordable and accessible to consumers and businesses around the world. At Applied Materials, we turn today's innovations into the industries of tomorrow. Learn more at http://www.appliedmaterials.com/.
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